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Technological Advances in Micro and Submicro Photofabrication Imagery
Editor(s): William Converse; J. M. Graf

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Volume Details

Volume Number: 0055
Date Published: 1 March 1974

Table of Contents
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Image Characteristics Of A Positive Photoresist On Semiconductor Surfaces And Their Impact On Device Yield
Author(s): David J. Elliott; Michael T. Nash
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Advances In Photoresist Application
Author(s): Pete Atwell
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A Process Evaluation Of Gaf Microline Photoresist - PR 102
Author(s): Chris Ladas
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Photomask Terminology
Author(s): Phillip A. Schultz; Dino R. Ciarlo
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A Pioneering Step And Repeat Camera
Author(s): Robert E. Lewis; Philip E. Chandler
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200 X Direct Reduction Step And Repeat Camera
Author(s): Robert E. Lewis; Philip E. Chandler
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Mask Duplicator, Using Vacuum Contact
Author(s): Robert E. Lewis; Philip E. Chandler
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Diffractogram Step And Repeatability Testing
Author(s): Robert E. Lewis
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Technological Advances In Microcircuit Step And Repeat Cameras And Their Relationship To The Future Needs Of The Semiconductor Industry
Author(s): Thomas Wing
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An Iron Oxide Mask Blank For Photofabrication Of High Density Low Defect Integrated Circuits
Author(s): M.Patrick Risen
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Optical Tests For Mechanical Performance Of Modern Step-And-Repeat Cameras
Author(s): Jeremy D. Nichols
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Hard Surface Masks
Author(s): James Jacobson
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Projection Printing
Author(s): R. M. Finnila; S. C. Su; A. I . Braunstein
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Projection Photolithography For Microwave LSI-IC Applications
Author(s): Douglas Ritchie
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Automated Inspection Of IC Photomasks
Author(s): D. R. Ciarlo; P. A. Schultz; D. B. Novotny
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Accurate Measurement Of Slitwidths In Microphoto Fabrication Based On Lateral Interferometry
Author(s): Sandor Holly
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Industry-User Forum: Use Of Off-Contact Printing In The Microelectronics Industry
Author(s): George Koutures; Bill Converse; Karl Johannsmier; David Kuty; Chris Ladas; W. R. Livesay; Peter Moller; Leonard Perham
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Application Of Plasmas To Semiconductor Materials And Fabrication
Author(s): John Hollahan; James Mitzel
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Microalignment Of Vacuum Deposited Thin-Film Imagery
Author(s): G. Kramer; J. M. Graf
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New Developments In The Technology Of Micro-Reduction Cameras
Author(s): Harris Lee Cooperman
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Maskless I.C. Fabrication Using An Electron Beam Micropattern Generator
Author(s): W. R. Livesay
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