
Proceedings Paper
Simultaneous measurement of birefringence magnitude and direction using Wollaston prismFormat | Member Price | Non-Member Price |
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Paper Abstract
Simultaneous measurement of the birefringence magnitude and direction using Wollaston prism is presented. The
sinusoidally modulated laser beam passes through a circular polarizer, the birefringence sample and is split by a
Wollaston prism. The measuring beam is then detected by a bi-cell detector and two alternating current signals are
detected. Then the Wollaston prism is rotated by 45°, and another two alternating current signals are obtained. By
processing the four signals, the birefringence magnitude and direction is resolved simultaneously. In experiments, a
wedge waveplate was laterally moved and measured at different birefringence magnitude. The measured birefringence
magnitude linearly increased as the wedge waveplate was laterally moved. The maximum standard deviation of the
birefringence magnitude and direction is 0.11° and 0.05°The usefulness of this method is verified.
Paper Details
Date Published: 20 November 2012
PDF: 7 pages
Proc. SPIE 8563, Optical Metrology and Inspection for Industrial Applications II, 85630P (20 November 2012); doi: 10.1117/12.999670
Published in SPIE Proceedings Vol. 8563:
Optical Metrology and Inspection for Industrial Applications II
Kevin G. Harding; Peisen S. Huang; Toru Yoshizawa, Editor(s)
PDF: 7 pages
Proc. SPIE 8563, Optical Metrology and Inspection for Industrial Applications II, 85630P (20 November 2012); doi: 10.1117/12.999670
Show Author Affiliations
Longhai Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Beishi Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Zhejiang Univ. (China)
Univ. of the Chinese Academy of Sciences (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Beishi Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Zhejiang Univ. (China)
Lexing Zheng, Shanghai Institute of Optics and Fine Mechanics (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Published in SPIE Proceedings Vol. 8563:
Optical Metrology and Inspection for Industrial Applications II
Kevin G. Harding; Peisen S. Huang; Toru Yoshizawa, Editor(s)
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