
Proceedings Paper
355nm absorption in HfO2 and SiO2 monolayers with embedded Hf nanoclusters studied using photothermal heterodyne imagingFormat | Member Price | Non-Member Price |
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Paper Abstract
The role of the Hf nanoclusters as near-UV, nanosecond-pulse laser-damage initiators in HfO2 and SiO2-pair–based
multilayer coatings remains speculative. In this work we use photothermal heterodyne imaging (PHI) to investigate
absorption in HfO2 and SiO2 monolayers containing embedded nanometer-sized Hf clusters produced by backsidethrough-
thin-film ablation. Hf cluster size and areal-density distributions were characterized using transmission electron
microscopy. PHI measurements were taken for cluster-containing samples and for similarly prepared HfO2 and SiO2 film samples of the same thickness without clusters. These data allow us to evaluate a possible role in the damageprocess
initiation of two hypothetical sources of the localized absorption—Hf clusters and high-density areas of
electronic defects.
Paper Details
Date Published: 4 December 2012
PDF: 9 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85301H (4 December 2012); doi: 10.1117/12.981642
Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)
PDF: 9 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85301H (4 December 2012); doi: 10.1117/12.981642
Show Author Affiliations
S. Papernov, Univ. of Rochester (United States)
E. Shin, Univ. of Dayton (United States)
T. Murray, Univ. of Dayton (United States)
E. Shin, Univ. of Dayton (United States)
T. Murray, Univ. of Dayton (United States)
Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)
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