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Proceedings Paper

Short-wave boundary of applicability of relief-phase reflecting holograms on a thin film of a chalcogenide glassy semiconductor
Author(s): Sergey N. Koreshev; Vladislav P. Ratushnyi
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Paper Abstract

In the course of carrying out the present work, it was stated that a parasitic surface nano-structurization is peculiar to reflective relief-phase holograms obtained on thin layers of a chalcogenide glassy semiconductor (CGS). The results of experimental researches of the effect of a relief height for reflective relief-phase holograms on the parameters of their surface parasitic nano-structurization are presented in this paper. With the use of data obtained applying atomic force microscope (AFM) Solver P-47 and software complex “Nova”, it was defined a short-wave boundary for applicability of such holograms. In addition to the conventional software complex “Nova”, aiming at reducing time necessary for determination of a short-wave boundary for relief-phase hologram applicability, there was developed a software module, which operation is based on the determination of the averaged-out over a basic area (scanning area) relief profile shape of the hologram structure, the definition of root-mean-square roughness (RMSR) values of its surface averaged-out over the same basic area, and on the subsequent computation of the boundary wavelength for the hologram applicability. The determined short-wave boundary value came to 80nm. Starting from this value, the holograms with the relief height optimal from the view of maximal diffraction efficiency meet the Marechal’s criterion σ ≤ λ/27 (σ - rootmean- square roughness parameter) and the criterion of permitted light diffusion σ ≤ λ/100. Thus, the level of light diffusion and aberration permitted for precision optical systems is ensured in a reconstructed with their use image.

Paper Details

Date Published: 1 March 2013
PDF: 7 pages
Proc. SPIE 8644, Practical Holography XXVII: Materials and Applications, 86440W (1 March 2013); doi: 10.1117/12.981446
Show Author Affiliations
Sergey N. Koreshev, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
Vladislav P. Ratushnyi, HoloGrate, JSC (Russian Federation)

Published in SPIE Proceedings Vol. 8644:
Practical Holography XXVII: Materials and Applications
Hans I. Bjelkhagen; V. Michael Bove Jr., Editor(s)

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