Proceedings Paper
Effect of pulse duration on laser induced damage threshold of multilayer dielectric gratings| Format | Member Price | Non-Member Price |
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Paper Abstract
Multilayer dielectric gratings (MDGs) are more and more used to compress pulse in the next generation
of chirped-pulse amplification (CPA) system for high-energy petawatt (HEPW)-class lasers due to their
high efficiency and high damage threshold for picosecond pulses. The damage tests for MDGs were
carried out with long pulse (12ns) in air and short pulse (0.66~9.7ps) in vacuum at 1053nm,
respectively. The experiment methodologies and results were discussed. For both long and short pulse,
the initial damage locates at the grating ridges opposite to the incoming wave, which is consistent with
the maximum normalized electric field intensity (NEFI). For long pulse, the damage is characterized by
melting and boiling. And for short pulse, the damage is ascribed to multiphoton-induced avalanche
ionization because of the electric field enhancement in the grating groove structure. And Measurement
results of the dependence of damage threshold on the pulse width are presented. And the damage
threshold of MDG in beam normal is 4.4J/cm2 at 70° incidence angle for 9.7ps pulse.
Paper Details
Date Published: 4 December 2012
PDF: 9 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300L (4 December 2012); doi: 10.1117/12.977339
Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)
PDF: 9 pages
Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300L (4 December 2012); doi: 10.1117/12.977339
Show Author Affiliations
Fanyu Kong, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Yunxia Jin, Shanghai Institute of Optics and Fine Mechanics (China)
Dawei Li, Shanghai Institute of Laser Plasma (China)
Shanghai Institute of Laser Plasma (China)
Weixiao Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Yunxia Jin, Shanghai Institute of Optics and Fine Mechanics (China)
Dawei Li, Shanghai Institute of Laser Plasma (China)
Shanghai Institute of Laser Plasma (China)
Weixiao Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Tao Wang, Shanghai Institute of Laser Plasma (China)
Chaoyang Li, Shanghai Institute of Laser Plasma (China)
Hongbo He, Shanghai Institute of Optics and Fine Mechanics (China)
Guang Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Chaoyang Li, Shanghai Institute of Laser Plasma (China)
Hongbo He, Shanghai Institute of Optics and Fine Mechanics (China)
Guang Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Published in SPIE Proceedings Vol. 8530:
Laser-Induced Damage in Optical Materials: 2012
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; M J Soileau, Editor(s)
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