A stable and predictable material removal function (MRF) plays a crucial role in computer controlled optical surfacing (CCOS). For physical contact polishing case, the stability of MRF depends on intimate contact between polishing interface and workpiece. Rigid laps maintain this function in polishing spherical surfaces, whose curvature has no variation with the position on the surface. Such rigid laps provide smoothing effect for mid-spatial frequency errors, but can’t be used in aspherical surfaces for they will destroy the surface figure. Flexible tools such as magnetorheological fluid or air bonnet conform to the surface [1]. They lack rigidity and provide little natural smoothing effect. We present a rigidity controllable polishing tool that uses a kind of magnetorheological elastomers (MRE) medium [2]. It provides the ability of both conforming to the aspheric surface and maintaining natural smoothing effect. What’s more, its rigidity can be controlled by the magnetic field. This paper will present the design, analysis, and stiffness variation mechanism model of such polishing tool [3].

Date Published: 16 October 2012
PDF: 6 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84161S (16 October 2012); doi: 10.1117/12.974283

Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)