
Proceedings Paper
Optimization of the edge extension in dwell time algorithm for ion beam figuringFormat | Member Price | Non-Member Price |
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Paper Abstract
Ion beam figuring is capacity of removing materials at atoms, and the optical quality after polishing depends
on not only the accuracy of processing but also the accuracy of dwell time algorithm. Deconvolution is a
common method of determining the dwell time and it is generally carried out by matrix operations in the
computer, so the surface figure of the optical component needs to be extended to cover throughout the matrix.
First, this paper analyses the disadvantages of the extension by zero setting and Gaussian extension. And then
based on the principle of matrix convolution an optimization method for the edge extension is proposed,
which predicts the desired surface figure by the convolution of points in the workpiece. Finally, the
simulations for ion beam figuring with Gauss extension and the optimization method proposed are made, and
the results show that the optimization method taken into account the action of inner points has the better effect:
the edge effect is suppressed more effectively and the algorithm achieves higher accuracy.
Paper Details
Date Published: 16 October 2012
PDF: 6 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84162M (16 October 2012); doi: 10.1117/12.974277
Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)
PDF: 6 pages
Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84162M (16 October 2012); doi: 10.1117/12.974277
Show Author Affiliations
Liangxuan Shu, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Fan Wu, Institute of Optics and Electronics (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Fan Wu, Institute of Optics and Electronics (China)
Chunyan Shi, Institute of Optics and Electronics (China)
Published in SPIE Proceedings Vol. 8416:
6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)
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