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Proceedings Paper

Design Of An X-Ray Lithograahy Beam Line
Author(s): R . P. Rippstein; D. L. Katcoff; J. M. Oberschmidt
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Paper Abstract

The design of a lithographic beamline for use on a synchrotron x-ray source is an interdisciplinary problem. The joint objectives of delivering a well collimated, high intensity beam of x-rays to a photoresist while maintaining high or ultra-high vacuum integrity requires knowledge from a variety of fields. For example, one must apply accelerator physics, materials science, x-ray optics, mechanical engineering, ultra-high vacuum technology and control systems engineering in order to design beamline optical, mechanical, safety and control elements. We provide a description of the design of a beamline for use on the VUV ring at the National Synchrotron Light Source, Brookhaven National Laboratory, to be used with a commercially available step and repeat x-ray aligner.

Paper Details

Date Published: 1 August 1989
PDF: 8 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968533
Show Author Affiliations
R . P. Rippstein, I.B.M. Corporation (United States)
D. L. Katcoff, I.B.M. Corporation (United States)
J. M. Oberschmidt, I.B.M. Corporation (United States)

Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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