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Proceedings Paper

Soft X-Ray Induced Chemical Reactions In Novolak Resist
Author(s): Darryl W. Peters; David N. Tomes; Robert A. Grant; Richard J. West
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Paper Abstract

Soft x-ray (i.e., λ = 1.4 nm) exposed films of Olin Hunt WX242 novolak resist were analyzed by gel permeation chromatography (GPC), UV, and FTIR spectroscopy. The decrease in concentration of diazonapthaquinone (DNQ) sensitizer was determined from FTIR and UV absorption. A typical decrease in DNQ concentration of 20 to 30% was observed for a 100 mJ/cm2 dose of a 1.0 μm thick film, the normal dose for soft x-ray exposure. At this exposure level, development in Olin Hunt LSI developer (5:4) required 120 seconds yielding excellent linesize control and film retention. To assist identification of chemical species produced, GPC and FTIR data from soft x-ray exposed samples were compared to those from UV exposures of 1.0 μm films in air or a vacuum.

Paper Details

Date Published: 1 August 1989
PDF: 15 pages
Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); doi: 10.1117/12.968526
Show Author Affiliations
Darryl W. Peters, Hampshire Instruments Inc. (United States)
David N. Tomes, Hampshire Instruments Inc. (United States)
Robert A. Grant, Hampshire Instruments Inc. (United States)
Richard J. West, Olin Hunt Specialty Products, Inc. (United States)

Published in SPIE Proceedings Vol. 1089:
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII
Arnold W. Yanof, Editor(s)

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