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Proceedings Paper

Excimer Projection Lithography At 193-nm Wavelength
Author(s): M. Rothschild; D. J. Ehrlich
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Paper Abstract

Excimer laser projection lithography is expected to become a widely used technique, capable of high throughputs at resolution well below 0.5 μm. In this paper we demonstrate excimer projection patterning with 0.13-μm resolution, and we address issues related to laser engineering and optical materials, which are encountered in the design of practical excimer projection systems.

Paper Details

Date Published: 1 January 1988
PDF: 5 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968447
Show Author Affiliations
M. Rothschild, Massachusetts Institute of Technology (United States)
D. J. Ehrlich, Massachusetts Institute of Technology (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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