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Proceedings Paper

New 5X i-Line Projection Aligner For VLSI Fabrication
Author(s): Shuji Sugiyama; Tsutomu Tawa; Yoshitada Oshida; Toshiei Kurosaki; Fumio Mizuno
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Paper Abstract

A new i-line projection aligner, the LD-5010i, has been developed and has two primary features : good patterning ability and good overlay accuracy. In this paper, performance of the i-line projection system and the characteristic alignment method, called the two-wavelength detection, are described.

Paper Details

Date Published: 1 January 1988
PDF: 10 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988);
Show Author Affiliations
Shuji Sugiyama, Hitachi, Ltd (Japan)
Tsutomu Tawa, Hitachi, Ltd (Japan)
Yoshitada Oshida, Hitachi, Ltd (Japan)
Toshiei Kurosaki, Hitachi, Ltd (Japan)
Fumio Mizuno, Hitachi, Ltd (Japan)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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