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Proceedings Paper

Measuring Photoresist Spectral Response With A Spectrosensitometer
Author(s): Robert M Cogley; Steven E Knight; Thomas J Toomey
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Paper Abstract

As optical lithography moves into the area of submicron geometries, an increased understanding of lithographic process parameters is required. One area which requires careful examination is the interaction of the photoresist with specific spectral components of the actinic light. This will allow the photoresist performance to be separated from the performance of the imaging optics. An accurate indication of photoresist performance requires the measurement of photoresist response to a specific wavelength and energy dose. The spectrosensitometer reported on here was developed to address this need.

Paper Details

Date Published: 1 January 1988
PDF: 5 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968415
Show Author Affiliations
Robert M Cogley, IBM General Technology Division (United States)
Steven E Knight, IBM General Technology Division (United States)
Thomas J Toomey, IBM System Technology Division (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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