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Proceedings Paper

Use Of Carbonized Photoresist For Optical Mask Repair
Author(s): Michael S. Hibbs; Burn J. Lin; Yuli Vladimirsky
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Paper Abstract

Carbonized novolac photoresist has been demonstrated as a patching material for clear defects in optical masks. The processing is simple and uses commonly available equipment. The patches, though not as tough as chrome, adhere well and survive mask cleaning. Mask materials appear to survive heating up to 1000°C, but distortion testing has only been done up to 500°C. Adhesion of the carbonized resist begins to degrade above 700°C processing temperature.

Paper Details

Date Published: 1 January 1988
PDF: 5 pages
Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); doi: 10.1117/12.968399
Show Author Affiliations
Michael S. Hibbs, IBM General Technology Division (United States)
Burn J. Lin, IBM General Technology Division (United States)
Yuli Vladimirsky, Lawrence Berkeley Laboratory (United States)

Published in SPIE Proceedings Vol. 0922:
Optical/Laser Microlithography
Burn Jeng Lin, Editor(s)

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