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Proceedings Paper

Stepper Lens Characterization Using A Field Emission SEM
Author(s): Mike Tipton; Marylyn Hoy Bennett; Jim Pollard; Jack Smith; Ricky Jackson
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Paper Abstract

A method of stepper lens evaluation has been developed which utilizes a simple resolution test pattern of the type usually supplied with the stepper. Measurements are made using an automated field emission SEM equipped to perform whole wafer non-destructive critical dimension analysis. Measurement data on focus and sizing is then analyzed by a computer program easily run on a small personal computer. Information on reticle sizing errors and wafer flatness may also be included in the analysis to minimize errors.

Paper Details

Date Published: 1 January 1988
PDF: 7 pages
Proc. SPIE 0921, Integrated Circuit Metrology, Inspection, and Process Control II, (1 January 1988); doi: 10.1117/12.968352
Show Author Affiliations
Mike Tipton, Texas Instruments Inc (United States)
Marylyn Hoy Bennett, Texas Instruments Inc (United States)
Jim Pollard, Texas Instruments Inc (United States)
Jack Smith, Texas Instruments Inc (United States)
Ricky Jackson, Texas Instruments Inc (United States)

Published in SPIE Proceedings Vol. 0921:
Integrated Circuit Metrology, Inspection, and Process Control II
Kevin M. Monahan, Editor(s)

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