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Proceedings Paper

Chemical Reactions Induced By Soft X-Ray And E-Beam Exposure Of Novolac-Based Resists
Author(s): Derrick C. Mancini; James W. Taylor; T. V. Jayaraman; Richard J. West
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Paper Abstract

X-ray exposure of selected novolac resins and commercial novolac-based resists show more varied end products and more crosslinking reactions than observed in the UV exposure. E-beam and x-ray induced reactions are somewhat similar. Novolac resin without the photoactive component (PAC) was shown to crosslink suggesting that x-ray and e-beam mechanisms must take this into account. Difference FTIR spectra were indicative of the structural changes. Mass spectrometry was less effective because of the volatility of PAC, although novolac resin without PAC was shown to contribute to the gaseous byproducts of exposure. The role of crosslinking of the novolac resin in process latitude and image reversal is discussed.

Paper Details

Date Published: 1 January 1988
PDF: 10 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968338
Show Author Affiliations
Derrick C. Mancini, University of Wisconsin (United States)
James W. Taylor, University of Wisconsin (United States)
T. V. Jayaraman, Olin-Hunt Specialty Products (United States)
Richard J. West, Olin-Hunt Specialty Products (United States)

Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)

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