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Proceedings Paper

Aqueous Developable, Negative Working Resist Made Of Chlorinated Novolac Resin
Author(s): H. Hiraoka; A. Patlach; Kaolin N. Chiong; Daniel Seligson; Piero Pianetta
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Paper Abstract

Recently, three approaches to sub-micron imaging using negative working, aqueous developable, novolac resin or poly(hydroxystyrene)-based resists have been reported: (1) Image reversal of positive working photoresists (2) Acid hardenable resist with post-bake process, and (3) Contrast enhanced-resist with deep uv flood exposure. Negative working resists with high resolution are important for fabrication of advanced devices. In the present study we examine a simple two component system consisting of a chlorinated novolac resin and an aromatic bisazide suitable for uv, electron and x-ray exposure. The resist is conventionally processed in aqueous developer, and provides negative working resist images with 0.25 μm space and line resolution without swelling or scum.

Paper Details

Date Published: 1 January 1988
PDF: 6 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968310
Show Author Affiliations
H. Hiraoka, IBM Almaden Research Center (United States)
A. Patlach, IBM Almaden Research Center (United States)
Kaolin N. Chiong, IBM T. J. Watson Research Center (United States)
Daniel Seligson, Intel Corporation (United States)
Piero Pianetta, Stanford Synchrotron Radiation Laboratory (United States)

Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)

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