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Proceedings Paper

I-Line Lithography Using A New Water-Soluble Contrast Enhancing Material
Author(s): Masayuki Endo; Masaru Sasago; Yoshihiko Hirai; Kazufumi Ogawa; Takeshi Ishihara
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Paper Abstract

I-line lithography using contrast enhanced lithography (CEL) has been developed. With this technology, we used a newly-developed water-soluble contrast enhancing material. This material consists of p-morpholinobenzene diazonium chloride zinc chloride salt, poly(p-styrene sulfonic acid) and water. P-morpholinobenzene diazonium chloride zinc chloride salt's absorption peak is at around 365 nm. It also has high solubility in water and has excellent photobleaching characteristics. The poly(p-styrene sulfonic acid) as a matrix polymer prevents degradation of the diazonium salt in water, so it makes possible the long-term stability of the water-soluble contrast enhancing material. This lithography is capable of 0.5-μm pattern fabrication and it is convinced to be the major lithographic technology for 16 mega-bits DRAM production.

Paper Details

Date Published: 1 January 1988
PDF: 9 pages
Proc. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 10.1117/12.968306
Show Author Affiliations
Masayuki Endo, Matsushita Electric Ind. Co. (Japan)
Masaru Sasago, Matsushita Electric Ind. Co. (Japan)
Yoshihiko Hirai, Matsushita Electric Ind. Co. (Japan)
Kazufumi Ogawa, Matsushita Electric Ind. Co. (Japan)
Takeshi Ishihara, Matsushita Electric Ind. Co. (Japan)

Published in SPIE Proceedings Vol. 0920:
Advances in Resist Technology and Processing V
Scott A. MacDonald, Editor(s)

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