Nickel doped SnO₂ films with special optical, electrical and magnetic properties have attracted more attention for practical spintronic applications. The present work aims to obtain Ni doped SnO₂ films deposited on the glass and silicon substrates by sol-gel method. The as-prepared films and thermally treated ones (at 500°C for 1h) were characterized by Scanning Electron Microscopy (SEM), Spectroscopic Ellipsometry (SE) and UV-VIS transmittance measurements. The obtained films are amorphous according to X-ray diffraction patterns. After three layer depositions, similar film thickness were obtained (around 200 nm), on both type of substrate used. The influence of the substrates and number of depositions on the structural and optical properties of the Ni doped SnO₂ films was established.

Date Published: 1 November 2012
PDF: 6 pages
Proc. SPIE 8411, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VI, 84111R (1 November 2012);

Published in SPIE Proceedings Vol. 8411:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VI
Paul Schiopu; Razvan Tamas, Editor(s)