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Proceedings Paper

Panel Discussion On Grating Technology
Author(s): Chang H. Chi; Hugh L. Garvin; Erwin G. Loewen; William R. Hunter; Jeremy M. Lerner; Michael C. Hutley
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Paper Abstract

CC: I would like to ask the panel four questions of general interest, and since our time is rather limited, I would like to ask you to try to limit your comments to three or four minutes. The questions are the following: 1. How would you characterize the progress of grating technology over the past 5 years, particularly in the area of theoretical analysis, experimental applications, and diagnostics? 2. What are the areas that need innovative ideas and technical break-throughs. This question is addressed more for the benefit of younger people. Suppose we have, for example, a Ph.D. student wanting to do a thesis; in what areas would you like to suggest they put their study time in? 3. What are the major problems in the grating technology community? Do they include funding, work force (are we educating enough talent in the Universities?), industrial secrecy, government assistance, international cooperation, patent protection, or any other items? 4. What actions can you suggest to promote the welfare of the grating technology community? Has it been worthwhile to come to this conference? Are there some things that we can change? What recommendations do von feel we should make?

Paper Details

Date Published: 10 February 1981
PDF: 6 pages
Proc. SPIE 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I, (10 February 1981); doi: 10.1117/12.965666
Show Author Affiliations
Chang H. Chi, Hughes Aircraft Company (United States)
Hugh L. Garvin, Hughes Research Laboratories (United States)
Erwin G. Loewen, Bausch and Lomb (United States)
William R. Hunter, Naval Research Laboratory (United States)
Jeremy M. Lerner, Instruments SA (United States)
Michael C. Hutley, National Physical Laboratory (England)

Published in SPIE Proceedings Vol. 0240:
Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I
C. H. Chi; E. G. Loewen; C. L. O'Bryan III, Editor(s)

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