Proceedings Paper
Pulsed Laser Deposition of HTSC Thallium Films| Format | Member Price | Non-Member Price |
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Paper Abstract
Pulsed laser deposition is a technique commonly used to deposit high quality thin films of high temperature superconductors. We discuss the results obtained when this technique is applied to the deposition of Tl-CA-Ba-Cu-O thin films using a frequency doubled Nd:YAG laser operating at 532 nm and an excimer laser operating at 248 nm. Films with onset temperatures of 125 K and zero resistance temperatures of 110 K deposited on (100) oriented MgO from a composite T12Ca2Ba2Cu3Ox target were obtained at both wavelengths upon appropriate post deposition annealing. We will discuss the microstructure and composition as a function of laser wavelength and annealing conditions.
Paper Details
Date Published: 19 March 1990
PDF: 18 pages
Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); doi: 10.1117/12.965150
Published in SPIE Proceedings Vol. 1187:
Processing of Films for High Tc Superconducting Electronics
T. Venkatesan, Editor(s)
PDF: 18 pages
Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); doi: 10.1117/12.965150
Show Author Affiliations
N. J. Ianno, University of Nebraska (United States)
J. A. Woollam, University of Nebraska (United States)
S. H. Liou, University of Nebraska (United States)
J. A. Woollam, University of Nebraska (United States)
S. H. Liou, University of Nebraska (United States)
D. Thompson, University of Nebraska (United States)
B. Johs, University of Nebraska (United States)
B. Johs, University of Nebraska (United States)
Published in SPIE Proceedings Vol. 1187:
Processing of Films for High Tc Superconducting Electronics
T. Venkatesan, Editor(s)
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