Electron beam lithography is an efficent method for fabricating x-ray zone plates. In this report, fabrication of x-ray zone plates by electron beam lithography whose applications are for an x-ray microscope and an x-ray linear monochromator at the undulator radiation line (fundamental wavelengths:1.3-3.0 nm) of the Photon Factory in Tsukuba. Experiments using synchrotron radiation to characterize fabricated zone plates are described. It is also shown that it is feasible to fabricate x-ray zone plates with spatial resolution of 20 nm by electron beam lithography.

Date Published: 1 January 1986
PDF: 9 pages
Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964944

Published in SPIE Proceedings Vol. 0733:
Soft X-Ray Optics and Technology
E. Koch; Guenther A. Schmahl, Editor(s)