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Proceedings Paper

Measurements Of Diffraction Properties Of Selected Multilayers Using A Triple-Axis Perfect Crystal X-Ray Diffractometer
Author(s): Allan Hornstrup; Finn E. Christensen; Herbert W. Schnopper
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Paper Abstract

We present measurements of diffraction peaks from six different multilayers of W/Si, Ni/C and ReW/C-layering. We have used FeKa-radiation and a three-axis, perfect crystal, x-ray diffractometer. The measurements suggest that these multilayers do not suffer seriously from imperfections. Improper estimates of the relative layer thickness of the two components may be as important as imperfections for these multilayers. All the multilayers studied show mosaicity which would be expected to originate in the substrate.

Paper Details

Date Published: 1 January 1986
PDF: 10 pages
Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964929
Show Author Affiliations
Allan Hornstrup, Technical University of Denmark (Denmark)
Finn E. Christensen, Danish Space Research Institute (Denmark)
Herbert W. Schnopper, Danish Space Research Institute (Denmark)

Published in SPIE Proceedings Vol. 0733:
Soft X-Ray Optics and Technology
E. Koch; Guenther A. Schmahl, Editor(s)

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