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Proceedings Paper

Laser-plasma XUV sources generated by KrF lasers
Author(s): F. O'Neill
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Paper Abstract

Recent developments at the Rutherford Appleton Laboratory on the use of 249nm KrF lasers for generating laser-plasma XUV sources are reviewed. XUV sources are produced using both a high energy (200J, 5Ons), purpose-built single shot laser and a low energy (0.7J, 25ns), repetitive(1 Hz) commercial system. These new sources have been applied to experiments in the areas of X-ray microscopy and X-ray lithography.

Paper Details

Date Published: 1 January 1986
PDF: 8 pages
Proc. SPIE 0733, Soft X-Ray Optics and Technology, (1 January 1986); doi: 10.1117/12.964885
Show Author Affiliations
F. O'Neill, SERC (UK)

Published in SPIE Proceedings Vol. 0733:
Soft X-Ray Optics and Technology
E. Koch; Guenther A. Schmahl, Editor(s)

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