Proceedings PaperLaser-plasma XUV sources generated by KrF lasers
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Recent developments at the Rutherford Appleton Laboratory on the use of 249nm KrF lasers for generating laser-plasma XUV sources are reviewed. XUV sources are produced using both a high energy (200J, 5Ons), purpose-built single shot laser and a low energy (0.7J, 25ns), repetitive(1 Hz) commercial system. These new sources have been applied to experiments in the areas of X-ray microscopy and X-ray lithography.