Proceedings Paper
Multilayers for X-Ray Optics: Production by Diode Sputtering and Characterization by Microcleavage Transmission Electron Microscopy| Format | Member Price | Non-Member Price |
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Paper Abstract
A multilayer with 99 bi-layers and a 2.5 nm period made of carbon and tungsten has been produced as a test sample for a diode sputtering apparatus and process. The process included Microcleavage Transmission Electron Microscopy as a rapid characterization method.
Paper Details
Date Published: 9 April 1987
PDF: 9 pages
Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); doi: 10.1117/12.964843
Published in SPIE Proceedings Vol. 0688:
Multilayer Structures & Laboratory X-Ray Laser Research
Natale M. Ceglio; Pierre Dhez, Editor(s)
PDF: 9 pages
Proc. SPIE 0688, Multilayer Structures & Laboratory X-Ray Laser Research, (9 April 1987); doi: 10.1117/12.964843
Show Author Affiliations
E. Ziegler, Argonne National Laboratory (United States)
Y. Lepetre, Argonne National Laboratory (United States)
Y. Lepetre, Argonne National Laboratory (United States)
G. Fenske, Argonne National Laboratory (United States)
Published in SPIE Proceedings Vol. 0688:
Multilayer Structures & Laboratory X-Ray Laser Research
Natale M. Ceglio; Pierre Dhez, Editor(s)
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