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Proceedings Paper

Multiple Aspheric Systems For The Lithography Of VLSI Circuits
Author(s): D. J. Nicholas
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Paper Abstract

The theory developed for perturbed apsheric singlets is used to design a minimum aspheric component optical circuit for use in VLSI. The specification is for a circuit with optical reduction of 10:1 with flat field imaging of a 100mm diameter object field and a resolution of 0.5μm or better. A discussion of the minimising procedure is given together with the theoretically expected performance of the circuit using numerically generated holograms.

Paper Details

Date Published: 3 November 1986
PDF: 9 pages
Proc. SPIE 0645, Optical Manufacturing, Testing and Aspheric Optics, (3 November 1986); doi: 10.1117/12.964492
Show Author Affiliations
D. J. Nicholas, Rutherford Appleton Laboratory (England)

Published in SPIE Proceedings Vol. 0645:
Optical Manufacturing, Testing and Aspheric Optics
Gregory M. Sanger, Editor(s)

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