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Proceedings Paper

Emissivity Issues In Pyrometric Temperature Monitoring For RTP Systems
Author(s): Jaim Nulman
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Paper Abstract

The emissivity of silicon wafers determine the temperature control in closed loop rapid thermal processing (RTP) systems. Silicon surface roughness, doping, and layers affect the intrinsic wafer emissivity, while RTP chamber walls reflectance reduces the amplitude of these effects. For temperatures below 600V, device side topography and layers also affect the emissivity of the wafer. Narrow band and wide band pyrometers show similar behavior with respect to layers on the wafer, as indicated by experimental and modeling techniques.

Paper Details

Date Published: 6 April 1990
PDF: 11 pages
Proc. SPIE 1189, Rapid Isothermal Processing, (6 April 1990); doi: 10.1117/12.963960
Show Author Affiliations
Jaim Nulman, Applied Materials, Inc. (United States)

Published in SPIE Proceedings Vol. 1189:
Rapid Isothermal Processing
Rajendra Singh, Editor(s)

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