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Proceedings Paper

Liquid Particle Counting Of Photoresists And Auxiliaries For Defect Control
Author(s): Jeffrey K. Hecht; Edward J. Reardon; Douglas A. Thompson
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Paper Abstract

Laser light scattering, a sensitive and versatile method, has been used to detect and classify particles in a variety of liquids. Semiconductor manufacturers have used liquid particle counting (LPC) to monitor deionized water streams and incoming chemicals. Recently, attempts have been made to extend this technology to photoresists and auxiliaries with the goal of setting specifications acceptable to both vendors and users. This paper discusses the efforts of a photoresist manufacturer to incorporate LPC into quality control and assurance. Examples of applications of LPC to other issues of photoresist purity are also provided.

Paper Details

Date Published: 20 August 1986
PDF: 8 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963732
Show Author Affiliations
Jeffrey K. Hecht, Dynachem Division Morton Thiokol, Inc. (United States)
Edward J. Reardon, Dynachem Division Morton Thiokol, Inc. (United States)
Douglas A. Thompson, Dynachem Division Morton Thiokol, Inc. (United States)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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