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Proceedings Paper

Exposing Patterns With A Scanning Laser System
Author(s): Shi-kay Yao; Boris Meshman
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Paper Abstract

High quality reticles are made optically using an electro-optical system with sixteen scanning laser beams. Recent advances provide pattern accuracy of ± 0.125 micron. Edge acuity of 0.15 micron three sigma is now routine. Supported by high speed electronics with 160 MHz data rate, it is one of the fastest pattern generators available to date. Since it works in a raster scan mode, it can handle extremely high flash count patterns with ease. With preprocessed data tape, checkerboard type of pattern in 10 micron by 10 micron squares has been printed at a rate of 40,000 square per second (equivalent to 144 million flashes per hour). Another major advantage of this system comes from the use of conventional photo-resists. With a typical environmental chamber, one can fabricate high quality, low pin hole density patterns at high writing speed. Detailed system characteristics as well as pattern generation capabilities will be reported in this paper.

Paper Details

Date Published: 20 August 1986
PDF: 6 pages
Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); doi: 10.1117/12.963715
Show Author Affiliations
Shi-kay Yao, TRE Semiconductor Equipment Corporation (United States)
Boris Meshman, TRE Semiconductor Equipment Corporation (United States)

Published in SPIE Proceedings Vol. 0633:
Optical Microlithography V
Harry L. Stover, Editor(s)

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