In order to extend the use of the EPA 914 into the submicron range, using conventional lithographic production tools, a modified version, EPA 914 IR has been formulated which is expected to have a shelf-life stability approaching conventional positive resists and allowing it to operate in a "negative" mode, without requiring the IMTEC/YES approach. The lithographic evaluation of EPA 914 IR described herein considers the following lithographic properties using both the Micralign 600-552HT and the GCA DSW 6000: *1. Linewidth control for both isolated/group lines. *2. Depth of focus vs. CD. 3. Linewidth control for nominal,--1.00 micron lines/spaces. 4. The effect of the following process parameters on lithographic properties (1-3) will be considered as well: a) Initial exposure b) Post-exposure bake c) Flood exposure d) Develop condition(s)

Date Published: 9 July 1986
PDF: 8 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963648

Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)