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Proceedings Paper

New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter
Author(s): Shin-ichi Sanada; Masataka Miyamura
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Paper Abstract

Several kinds of dyeable negative photoresist materials for CCD micro color filters, developed in our Laboratories, are reported. Quaternary ammonium salt-terminating acrylate-glycidyl methacrylate copolymers with bisazides have been developed as negative working resists. Descriptions on their synthesis, lithographic data and the micro color filter process for these resists are mentioned.

Paper Details

Date Published: 9 July 1986
PDF: 5 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963640
Show Author Affiliations
Shin-ichi Sanada, Toshiba Corporation (Japan)
Masataka Miyamura, Toshiba Corporation (Japan)

Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)

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