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Proceedings Paper

A Quantitative Assessment Of Image Reversal, A Candidate For A Submicron Process With Improved Linewidth Control
Author(s): Rupert M.R. Gijsen; Hennie J.J. Kroon; Frans A. Vollenbroek; Rene Vervoordeldonk
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Paper Abstract

The performance of the image reversal process is evaluated. As image reversal includes process parameters to control the slope of the resist profile it offers the possibility to compensate for the bulk effect. Additionally dye can be added to the resist to some extent, to reduce reflections at the substrate, without degrading the slope. Data was collected to quantify the potential of image reversal with respect to the latitude for development and exposure dose variations for both the imidazole, the ammonia and the AZ5214 process. Trends indicating how to find the best operating point for each process will be discussed. To demonstrate the submicron capabilities of image reversal resist patterns with lines and spaces down to 0.5 μm over 0.5 μm topography will be shown.

Paper Details

Date Published: 9 July 1986
PDF: 9 pages
Proc. SPIE 0631, Advances in Resist Technology and Processing III, (9 July 1986); doi: 10.1117/12.963632
Show Author Affiliations
Rupert M.R. Gijsen, Philips Research Laboratories (The Netherlands)
Hennie J.J. Kroon, Philips Research Laboratories (The Netherlands)
Frans A. Vollenbroek, Philips Research Laboratories (The Netherlands)
Rene Vervoordeldonk, Philips Research Laboratories (The Netherlands)

Published in SPIE Proceedings Vol. 0631:
Advances in Resist Technology and Processing III
C. Grant Willson, Editor(s)

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