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Proceedings Paper

Micromechanics For X-Ray Lithography And X-Ray Lithography For Micromechanics
Author(s): H. Guckel
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Paper Abstract

X-ray masks are micromechanical structures. They are best fabricated from thin films of low atomic number materials with built-in tensile strain. Optimized low pressure chemical vapor deposited polysilicon films have the desired characteristics for excellent x-ray masks. They also offer many other application opportunities as stencil masks and optical filters. Deep x-ray lithography has been developed in Germany. Concepts in very thick photoresist processing are fundamentally involved in this procedure. The end result: nearly three-dimensional metal structures will be very beneficial to future micro-structure fabrication.

Paper Details

Date Published: 9 November 1989
PDF: 8 pages
Proc. SPIE 1167, Precision Engineering and Optomechanics, (9 November 1989); doi: 10.1117/12.962936
Show Author Affiliations
H. Guckel, University of Wisconsin (United States)

Published in SPIE Proceedings Vol. 1167:
Precision Engineering and Optomechanics
Daniel Vukobratovich, Editor(s)

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