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Proceedings Paper

Multilayer X-Ray Optics Produced By Atomic Layer Epitaxy
Author(s): K. Shurtleff; D. Allred; R. Perkins; J. Thorne
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Paper Abstract

Atomic layer epitaxy is a new deposition technique which is ideally suited to producing multilayer x-ray optics with very small d-spacings. ALE allows monolayer control of film thickness, produces sharp interfaces and results in high crystalline perfection of multilayers. We have established criteria for selecting pairs of materials which can be deposited by ALE and have experimentally measured these criteria. We have also developed computer codes which predict x-ray reflectivity from multilayers deposited by ALE.

Paper Details

Date Published: 28 July 1989
Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962655
Show Author Affiliations
K. Shurtleff, Brigham Young University (United States)
D. Allred, Brigham Young University (United States)
R. Perkins, Brigham Young University (United States)
J. Thorne, Brigham Young University (United States)

Published in SPIE Proceedings Vol. 1160:
X-Ray/EUV Optics for Astronomy and Microscopy
Richard B. Hoover, Editor(s)

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