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Proceedings Paper

Fabrication And Test Of Soft X-Ray Multilayer Diffraction Gratings
Author(s): H. Berrouane; J. Khan M. Andre; C. Malek; S. Fouchet; F. R. Ladan; R. Rivoira; R. Barchewitz
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Paper Abstract

Holographic lithography was used to produce a 0.36 μm spatial period grating on top of a Mo/C layered synthetic microstructure. The pattern was transferred to the multilayer mirror by reactive ion etching. The performance of the device has been evaluated at the Cu.Lα,β3 wavelength ( 1.33 nm ). A simple theoretical model explains the main features of the diffraction efficiency of the soft X-ray highly dispersive multilayer mirror.

Paper Details

Date Published: 28 July 1989
PDF: 6 pages
Proc. SPIE 1160, X-Ray/EUV Optics for Astronomy and Microscopy, (28 July 1989); doi: 10.1117/12.962652
Show Author Affiliations
H. Berrouane, Laboratoire de Chimie - Physique (France)
J. Khan M. Andre, Laboratoire de Chimie - Physique (France)
C. Malek, Laboratoire de Chimie - Physique (France)
S. Fouchet, CNET (France)
F. R. Ladan, Laboratoire de Microstructure et de Microelectronique, CNRS (France)
R. Rivoira, Universite d'Aix - Marseille III (France)
R. Barchewitz, Laboratoire de Chimie - Physique (France)

Published in SPIE Proceedings Vol. 1160:
X-Ray/EUV Optics for Astronomy and Microscopy
Richard B. Hoover, Editor(s)

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