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Proceedings Paper

Multilayer X-Ray Optics Produced By Atomic Layer Epitaxy
Author(s): J. K. Shurtleff; D. D. Allred; R. T. Perkins; J. M. Thorne
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Paper Abstract

Thin film deposition techniques currently being used to produce multilayer x-ray optics (MXOs) have difficulty producing smooth, uniform multilayers with d-spacings less than about twelve angstroms. We are investigating atomic layer epitaxy (ALE) as an alternative to these techniques. ALE is a relatively new thin film deposition technique which we believe can produce MXOs with very small d-spacings. ALE accomplishes this by depositing a single layer of atoms during each cycle of the deposition process. Multilayers deposited by ALE should have sharp interfaces and smooth, uniform layers with precise d-spacings.

Paper Details

Date Published: 27 November 1989
PDF: 10 pages
Proc. SPIE 1159, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy and Atomic Physics, (27 November 1989); doi: 10.1117/12.962620
Show Author Affiliations
J. K. Shurtleff, Brigham Young University (United States)
D. D. Allred, Brigham Young University (United States)
R. T. Perkins, Brigham Young University (United States)
J. M. Thorne, Brigham Young University (United States)

Published in SPIE Proceedings Vol. 1159:
EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy and Atomic Physics
Charles J. Hailey; Oswald H. W. Siegmund, Editor(s)

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