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Proceedings Paper

Dual Ion Beam Deposition Of Diamond Films On Optical Elements
Author(s): A . H. Deutchman; R. J. Partyka; J. C. Lewis
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Paper Abstract

Diamond film deposition processes are of great interest because of their potential use for the formation of both protective as well as anti-reflective coatings on the surfaces of optical elements. Conventional plasma-assisted chemical vapor deposition diamond coating processes are not ideal for use on optical components because of the high processing temperatures required, and difficulties faced in nucleating films on most optical substrate materials. A unique dual ion beam deposition technique has been developed which now makes possible deposition of diamond films on a wide variety of optical elements. The new DIOND process operates at temperatures below 150 aegrees Farenheit, and has been used to nucleate and grow both diamondlike carbon and diamond films on a wide variety of optical :taterials including borosilicate glass, quartz glass, plastic, ZnS, ZnSe, Si, and Ge.

Paper Details

Date Published: 15 January 1989
PDF: 11 pages
Proc. SPIE 1146, Diamond Optics II, (15 January 1989); doi: 10.1117/12.962069
Show Author Affiliations
A . H. Deutchman, BeamAlloy Corporation (United States)
R. J. Partyka, BeamAlloy Corporation (United States)
J. C. Lewis, BeamAlloy Corporation (United States)

Published in SPIE Proceedings Vol. 1146:
Diamond Optics II
Albert Feldman; Sandor Holly, Editor(s)

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