Diamond films by chemical vapor deposition have good potential for optical application only if transparent films can be produced. Thin diamond films were deposited on silicon, lead glass, MgO, fused silica and soda-lime silica at low temperatures (<500°C) by microwave plasma enhanced chemical vapor deposition. Low temperatures were achieved either by lowering microwave powers and pressures or by remoting the plasma. The deposited films were either white and transluscent or highly transparent depending on the different gas mixtures being used. The effect of gas composition on diamond formation will be discussed. Raman peak shifts of 2 to 8 cm^-1 were observed due to the strain in the film. The exact temperature of the growth surface is uncertain as measurements were made only of the substrate bulk. Estimated temperatures were reported by careful calibration.

Date Published: 15 January 1989
PDF: 9 pages
Proc. SPIE 1146, Diamond Optics II, (15 January 1989); doi: 10.1117/12.962057

Published in SPIE Proceedings Vol. 1146:
Diamond Optics II
Albert Feldman; Sandor Holly, Editor(s)