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Proceedings Paper

Microscope Objectives For Semiconductor Technology
Author(s): Wolfgang Vollrath
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Paper Abstract

During the past ten years the highest requirements for an overall optical performance of microscope objectives have come from the semiconductor industry. The applications in the optical inspection and metrology of masks and wafers called for special lenses with long working distances and lenses with high magnification and high numerical aperture. Not only is the correction of image aberrations of importance, but among other features also the reduction of internal reflections and the autofocus capability. The performance of the latest generation of microscope objectives is demonstrated in comparison with older designs. While monochromatic image aberrations of modern lenses are negligible with regard to diffraction, the polychromatic correction is still a challenging task and defines the limitations in image quality. But even in this respect the newly developed Wild Leitz lens PL APO 100x/0.95 demonstrates that the physical limits have been reached both in design and manufacturing.

Paper Details

Date Published: 11 October 1989
PDF: 6 pages
Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961758
Show Author Affiliations
Wolfgang Vollrath, Wild Leitz GmbH (Germany)

Published in SPIE Proceedings Vol. 1138:
Optical Microlithography and Metrology for Microcircuit Fabrication
Michel J. Lacombat; Stefan Wittekoek, Editor(s)

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