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Proceedings Paper

Design Principles For An Illumination System Using An Excimer Laser As A Light Source
Author(s): Johannes Wangler; J. Liegel
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Paper Abstract

Design principles for the illumination system of a DUV wafer stepper are derived by examining the coherence properties of a KrF excimer laser and the effect of DUV radiation of high energy density on fused silica, the material used for the optical components. Alternative designs are presented and discussed.

Paper Details

Date Published: 11 October 1989
PDF: 8 pages
Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); doi: 10.1117/12.961753
Show Author Affiliations
Johannes Wangler, Carl Zeiss (Germany)
J. Liegel, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 1138:
Optical Microlithography and Metrology for Microcircuit Fabrication
Michel J. Lacombat; Stefan Wittekoek, Editor(s)

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