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Proceedings Paper

Applications Of Glass Etching To Guided Wave Optics
Author(s): G. Voirin; B. Scheja; O. Parriaux
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Paper Abstract

A glass etching technology with a HF solution and a chromium mask is presented. The technology allows the etching of semi-circular grooves as deep as 250 μm within a few microns with good surface quality. Two etched substrates can be superposed to obtain a cicular channel that can be filled with plastic to obtain a waveguide. The design of the mask permits the fabrication of guided wave plumbing platforms of light distribution, coupling and intersection circuits compatible with hard clad silica or plastic fibers. The feasability of a coupling platform is demonstrated. The technology also permits the positioning of optical fibers in front of integrated optic circuits.

Paper Details

Date Published: 21 December 1989
PDF: 2 pages
Proc. SPIE 1128, Glasses for Optoelectronics, (21 December 1989); doi: 10.1117/12.961449
Show Author Affiliations
G. Voirin, CSEM (Switzerland)
B. Scheja, CSEM (Switzerland)
O. Parriaux, CSEM (Switzerland)

Published in SPIE Proceedings Vol. 1128:
Glasses for Optoelectronics
Giancarlo C. Righini, Editor(s)

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