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Proceedings Paper

SiO[sub]2[/sub] Film Grown On Glass In Aqueous Solution
Author(s): Hideo Kawahara; Takuji Goda; Hirotsugu Nagayama; Hisao Honda; Akihiro Hishinuma
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Paper Abstract

Si02 film deposition on a glass was made by LPD method (Liquid Phase Deposition). This process involes the deposition and growth of Si02 layer on glass surface while immersing it in hexafluorosilicic acid (H2SiF6) solution supersaturated with silica. In this study, the influence of the impurities and H2SiF6 concentration in the solution on Si02 film properties was investigated by use of SIMS, ICP, Ellipsometry,IRRS and etch rate measurement. The results showed that LPD based Si02 film composition was scarcely affected by the concentration of such impurities as Na, K and Ca contained in the solution. Furthermore it was found that higher H2SiF6 concentration led to Si02 film with lower refractive index and lower etch rate. To have proper understanding of these apparently inconsistent results, the specific role of fluorine contained in the solution and the film was discussed.

Paper Details

Date Published: 21 December 1989
PDF: 6 pages
Proc. SPIE 1128, Glasses for Optoelectronics, (21 December 1989); doi: 10.1117/12.961429
Show Author Affiliations
Hideo Kawahara, Nippon Sheet Glass Co. (Japan)
Takuji Goda, Nippon Sheet Glass Co. (Japan)
Hirotsugu Nagayama, Nippon Sheet Glass Co. (Japan)
Hisao Honda, Nippon Sheet Glass Co. (Japan)
Akihiro Hishinuma, Nippon Sheet Glass Co. (Japan)

Published in SPIE Proceedings Vol. 1128:
Glasses for Optoelectronics
Giancarlo C. Righini, Editor(s)

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