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Proceedings Paper

High Accuracy Determination Of Semiconductor Substrate And Waveguide Refractive Index By Prism Coupling
Author(s): S. Morasca; C. De Bernardi
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Paper Abstract

Measurements of the refractive index of semiconductor materials, both in wafer and in waveguide form, are presented. The technique used to this purpose is based on radiation coupling into the material by a prism; this method is used for the first time on semiconductors, by means of a silicon prism. Accuracy to the fourth decimal place is demonstrated, in favorable comparison to the best available data.

Paper Details

Date Published: 6 December 1988
PDF: 3 pages
Proc. SPIE 0993, Integrated Optical Circuit Engineering VI, (6 December 1988); doi: 10.1117/12.960084
Show Author Affiliations
S. Morasca, CSELT - Centro Studi e Laboratori Telecomunicazioni S.p.A. (Italy)
C. De Bernardi, CSELT - Centro Studi e Laboratori Telecomunicazioni S.p.A. (Italy)

Published in SPIE Proceedings Vol. 0993:
Integrated Optical Circuit Engineering VI
Mark A. Mentzer, Editor(s)

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