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Proceedings Paper

New Lenses For Microlithography
Author(s): Erhard Glatzel
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Paper Abstract

Giving the imaging bundle of rays two substantial bulges makes it possible to design 10x reduction lenses with large aperture and field size for microlithography without using high index glasses with poor transmission.

Paper Details

Date Published: 16 September 1980
PDF: 11 pages
Proc. SPIE 0237, 1980 International Lens Design Conference, (16 September 1980); doi: 10.1117/12.959098
Show Author Affiliations
Erhard Glatzel, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 0237:
1980 International Lens Design Conference
Robert E. Fischer, Editor(s)

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