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Proceedings Paper

Relationship Between Micro And Macro Reproduction Characteristics Of Kodak High Resolution Plates
Author(s): Robert E. Doran
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Paper Abstract

Traditional measurements of photographic sensitivity have been of little value to microelectronics mask makers. The primary concerns of the mask maker are control of microimagery dimensions and adequate developed density through variation in exposure. The macro characteristic curve or D-log E curve has been considered virtually meaningless in this application. This paper examines two of the micro characteristics of KODAK High Resolution Plates - the microcharacteristic curve relating linewidth to the logarithm of the exposure and the derivative, d(W)/d(log E), relating the rate of change of linewidth with log Exposure. The limited linear relationship between linewidth and macro density is examined. Representative data from a number of production coatings of KODAK High Resolution Plates are illustrated to examine the usefulness of macro density as a predictor of linewidth.

Paper Details

Date Published: 5 September 1980
PDF: 9 pages
Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958637
Show Author Affiliations
Robert E. Doran, Eastman Kodak Company (United States)

Published in SPIE Proceedings Vol. 0221:
Developments in Semiconductor Microlithography V
James W. Dey, Editor(s)

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