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Proceedings Paper

E-beam Computer Generated Holograms For Aspheric Testing
Author(s): K. M. Leung; J. C. Lindquist; L. T. Shepherd
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Paper Abstract

This paper discusses recent progress in producing computer-generated holograms (CGH) of low spatial distoration and high space-bandwidth product. The CGH are drawn directly on electron-resist using an electron beam pattern generator which is intended for use in the production of integrated circuits with sub-micron feature sizes. This approach not only reduces plotting errors below those introduced by indirect writing methods, but also provides more than 106 distortion-free resolution points in a hologram of correct size. The quality of the CGH made by this process will be illustrated by an example in the testing of an aspheric surface.

Paper Details

Date Published: 14 May 1980
PDF: 6 pages
Proc. SPIE 0215, Recent Advances in Holography, (14 May 1980); doi: 10.1117/12.958422
Show Author Affiliations
K. M. Leung, Honeywell Corporate Material Sciences Center (United States)
J. C. Lindquist, Honeywell Corporate Material Sciences Center (United States)
L. T. Shepherd, Honeywell Corporate Material Sciences Center (United States)

Published in SPIE Proceedings Vol. 0215:
Recent Advances in Holography
Poohsan N. Tamura; Tzuo-Chang Lee, Editor(s)

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