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Proceedings Paper

Mask Fabrication With Vector Scan Electron Beam System
Author(s): C. H. Ting; A. M. Patlach; A. J. Kraft; P. R. Jaskar
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Paper Abstract

An automated electron beam lithographic system, Vector-Scan-1, was designed to write patterns directly on device wafers as well as generate chrome masks for conventional optical processing. Due to its high current density, conventional AZ-1350 resist can be used directly in the mask making process. Its vector scan capability not only saves exposure time but also provides extremely compact pattern data. Using its laser interferometer servo control, extremely large capacity chips in both 1X masters and 10X reticles can be exposed with relative ease. The accuracy and speed of generating high resolution 1X chrome masks and 10X reticles generated by the VS-1 lithographic system for magnetic bubble fabrication are discussed in detail.

Paper Details

Date Published: 17 July 1979
PDF: 8 pages
Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); doi: 10.1117/12.957183
Show Author Affiliations
C. H. Ting, IBM (United States)
A. M. Patlach, IBM (United States)
A. J. Kraft, IBM (United States)
P. R. Jaskar, IBM (United States)

Published in SPIE Proceedings Vol. 0174:
Developments in Semiconductor Microlithography IV
James W. Dey, Editor(s)

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