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Proceedings Paper

Patterned Optical Filters To Encode Spectral Information For Solid State Imaging Devices
Author(s): John Murphy
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Paper Abstract

Patterned optical filters have been used for color TV cameras and infrared imaging systems. These filters can be manufactured by combining the techniques of micro-photolithography and resist lift-off. Micro patterns containing single-band or multi-band filtering can be produced on the surface of a single element. Current capabilities for the production of patterned filters will be reviewed, along with the practical limitations imposed by manufacturing techniques. Spectral characteristics required for visible and infrared applications will be discussed and compared with the characteristics commonly achieved in routine manufacture. Limitations on filter thickness, pattern size and pattern geometry which are dependent on the production techniques, will be treated. Micrographs of typical patterns will be presented for illustration. Practical manufacturing tolerances will be discussed. Prototype development work in thicker filters, tighter tolerances, and miniaturized patterns will be presented.

Paper Details

Date Published: 15 December 1977
PDF: 6 pages
Proc. SPIE 0116, Solid-State Imaging Devices, (15 December 1977); doi: 10.1117/12.955638
Show Author Affiliations
John Murphy, Optical Coating Laboratory, Inc. (United States)

Published in SPIE Proceedings Vol. 0116:
Solid-State Imaging Devices
Jim Campbell, Editor(s)

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