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Proceedings Paper

Future Possibilities Of Dioptric Lenses In Microelectronics
Author(s): Gerhard Ittner
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Paper Abstract

After a survey of the present state of optics in microelectronics future possibilities especially of dioptric lenses are discussed. Those lenses are marked mainly by the numerical aperture providing the resolution, and the diameter of image field. The numerical aper-ture seems to have a usefull limit between 0.4 and 0.5, providing minimum line widths of 0.4 to 0.7 microns. A future limit of field sizes cannot be given today. The possibility to develop new lenses is not only given by the capability of the optical designer, but also by other parameters, such as mechanical size limitations and lens manufactoring problems.

Paper Details

Date Published: 8 August 1977
PDF: 5 pages
Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955361
Show Author Affiliations
Gerhard Ittner, CARL ZEISS (Germany)

Published in SPIE Proceedings Vol. 0100:
Developments in Semiconductor Microlithography II
James W. Giffin, Editor(s)

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