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Proceedings Paper

Submicron X-Ray Lithography
Author(s): R. K. Watts; D. C. Guterman; H. M. Darley
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Paper Abstract

We present results of our evaluation of the X-ray lithographic technique for replication of submicron patterns generated by electron beam. Mylar membranes have largely been employed as substrates for X-ray masks, although silicon substrates have also been used. Absorber patterns with high aspect ratio have been obtained by electroplating and by ion milling. Circuit patterns have been replicated with 0.25μm features in both positive and negative X-ray resists.

Paper Details

Date Published: 20 September 1976
PDF: 8 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954840
Show Author Affiliations
R. K. Watts, Texas Instruments Inc. (United States)
D. C. Guterman, Texas Instruments Inc. (United States)
H. M. Darley, Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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