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Proceedings Paper

Masking With Matched Sets
Author(s): A. H. DePuy
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Paper Abstract

The emphasis today in wafer fabrication is to continually improve device yields. This is usually accomplished at the expense of the mask maker, who is consistently being requested to provide masks of higher and higher quality. Higher mask quality is also desired due to the long-life masks, especially when used with a proximity or projection printing system. A mask inspection and usage scheme has been developed, based on an age-old inspection technique, whereby higher device yields can be realized without paying the price of increasing mask quality.

Paper Details

Date Published: 20 September 1976
PDF: 5 pages
Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976);
Show Author Affiliations
A. H. DePuy, IBM System Products Division (United States)

Published in SPIE Proceedings Vol. 0080:
Developments in Semiconductor Microlithography
James W. Giffin, Editor(s)

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